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Conference paper

Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

In Proceedings, Ofc — 2009, pp. 1-3

By Wei, Lei1,2; Khomtchenko, Elena3; Alkeskjold, Thomas Tanggaard2; Bjarklev, Anders Overgaard2

From

Fiber Optics, Devices and Non-linear Effects, Department of Photonics Engineering, Technical University of Denmark1

Department of Photonics Engineering, Technical University of Denmark2

DTU Danchip, Technical University of Denmark3

Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.

Language: English
Publisher: IEEE
Year: 2009
Pages: 1-3
Proceedings: 2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC
ISBN: 1424426065 , 9781424426065 , 1557528659 and 9781557528650
Types: Conference paper
Keywords

(060.5295) Photonic crystal fibers (220.3740) Lithography (230.3720) Liquid-crystal devices Anisotropic magnetoresistance Coatings Etching Liquid crystal devices Lithography Optical control Photonic bandgap fibers Photonic crystal fibers Resists Thickness control anisotropically etched v-grooves electrically controlled liquid crystal electrode patterning holey fibres liquid crystal devices photolithography photonic band gap photonic bandgap fiber devices photonic crystals photoresists thick photoresist coating

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