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10 items by relevance
1 Conference paper

Infinite Etching Selectivity with Conventional Photoresist in a Bosch Process

Chang, Bingdong; Leussink, Pele; Jensen, Flemming; Hübner, Jörg; Jansen, Henri

Year: 2018

Language: English

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heilon bmk pfcgd ja
2 Journal article

DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process

Chang, Bingdong; Leussink, Pele; Jensen, Flemming; Hübner, Jörg; Jansen, Henri

Microelectronic Engineering — 2018, Volume 191, pp. 77-83

of more than 50 is achieved for trenches with 1 μm linewidths, while no erosion is observed for 360 nm thin standard photoresists. The mechanism behind this extraordinary infinite selectivity is mainly due to the depletion of C4F8 deposition species. Furthermore, a linear ramping of the etch step

Year: 2018

Language: English

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akmjehgcp dinfobl

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