5-nm-lines in Organic Ice Resists

Organic Ice Resist Lithography (OIRL) is a novel one-step method for patterning nanostructures using a thin frozen layer of beam sensitive organic material [1]. Fig. 1 sketches the basic implementation of OIRL. The entire process takes place in a single instrument, does not require cleanroom environment or any additional chemicals and is free of residual resist contamination.

In our recently published work [1] we have demonstrated the advantages of OIRL over other lithography methods, such as easy handling of fragile and non-planar surfaces and effective fabrication of 3D materials. OIRL was performed in our custom-built modified scanning electron microscope (SEM) [2].