Journal article
Imprinted silicon-based nanophotonics
Nanophotonics, Department of Photonics Engineering, Technical University of Denmark1
Department of Photonics Engineering, Technical University of Denmark2
Lab-on-a-Chip, Department of Micro- and Nanotechnology, Technical University of Denmark3
Department of Micro- and Nanotechnology, Technical University of Denmark4
Nanophotonic Devices, Department of Photonics Engineering, Technical University of Denmark5
Metamaterials, Department of Photonics Engineering, Technical University of Denmark6
Solid Mechanics, Department of Mechanical Engineering, Technical University of Denmark7
Department of Mechanical Engineering, Technical University of Denmark8
Center for Nanoteknologi, Centers, Technical University of Denmark9
We demonstrate and optically characterize silicon-on-insulator based nanophotonic devices fabricated by nanoimprint lithography. In our demonstration, we have realized ordinary and topology-optimized photonic crystal waveguide structures. The topology-optimized structures require lateral pattern definition on a sub 30-nm scale in combination with a deep vertical silicon etch of the order of ~300 nm.
The nanoimprint method offers a cost-efficient parallel fabrication process with state-of-the-art replication fidelity, comparable to direct electron beam writing.
| Language: | English |
|---|---|
| Year: | 2007 |
| Pages: | 1261-1266 |
| ISSN: | 10944087 |
| Types: | Journal article |
| DOI: | 10.1364/OE.15.001261 |
| ORCIDs: | Frandsen, Lars Hagedorn , Lavrinenko, Andrei , Jensen, Jakob Søndergaard , Sigmund, Ole and Kristensen, Anders |
